Invention Grant
- Patent Title: Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer
- Patent Title (中): 微机械系统装置包括位移电极和电荷捕获层
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Application No.: US10251196Application Date: 2002-09-20
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Publication No.: US07550794B2Publication Date: 2009-06-23
- Inventor: Mark W. Miles , John Batey , Clarence Chui , Manish Kothari
- Applicant: Mark W. Miles , John Batey , Clarence Chui , Manish Kothari
- Applicant Address: US CA Pleasanton
- Assignee: IDC, LLC
- Current Assignee: IDC, LLC
- Current Assignee Address: US CA Pleasanton
- Agency: Knobbe Martens Olson & Bear LLP
- Main IPC: H01L27/20
- IPC: H01L27/20 ; H01L29/84
Abstract:
In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
Public/Granted literature
- US20040058532A1 Controlling electromechanical behavior of structures within a microelectromechanical systems device Public/Granted day:2004-03-25
Information query
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