Invention Grant
US07550923B2 Plasma panel faceplate comprising UV radiation re-scattering means
失效
包括UV辐射再散射装置的等离子面板面板
- Patent Title: Plasma panel faceplate comprising UV radiation re-scattering means
- Patent Title (中): 包括UV辐射再散射装置的等离子面板面板
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Application No.: US10493668Application Date: 2002-10-21
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Publication No.: US07550923B2Publication Date: 2009-06-23
- Inventor: Jean-Pierre Creusot , Yvan Raverdy
- Applicant: Jean-Pierre Creusot , Yvan Raverdy
- Applicant Address: FR Boulogne-Billancourt
- Assignee: Thomson Licensing
- Current Assignee: Thomson Licensing
- Current Assignee Address: FR Boulogne-Billancourt
- Agent Robert D. Shedd; Harvey D. Fried; Patricia Verlangieri
- Priority: FR0113954 20011029
- International Application: PCT/FR02/03587 WO 20021021
- International Announcement: WO03/038853 WO 20030508
- Main IPC: H01J17/49
- IPC: H01J17/49

Abstract:
The invention relates to a faceplate including a dielectric layer and a protection layer. According to the invention, in order to re-scatter the UV radiation, the interface between the dielectric layer and the protection layer is structured such that it has an average roughness, which is included in the wavelength domain of said radiation, of between 130 and 20 nm in particular. Such re-scattering means are significantly more economical and effective than previous means. The aforementioned roughness can be obtained by performing an abrasion operation on the surface of the dielectric layer.
Public/Granted literature
- US20050077825A1 Plasma panel faceplate comprising uv radiation re-scattering means Public/Granted day:2005-04-14
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