Dental material which contains at least one compound of the formula [PG]m—R1—Z—SP—Y—R2—[WG]p, in which m=1, 2 or 3; p=1, 2 or 3; R1=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR′, CONH CONR′, COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof R2=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR′, CONH CONR′, COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof; PG=a radically polymerizable group; SP=a polymeric spacer which is selected from polyethylene glycol, polypropylene glycol, polyglycerol, polyalkyloxazoline, polyethyleneimine, polyacrylic acid, polymethacrylic acid, polyvinyl alcohol, polyvinyl acetate, poly-(2-hydroxyethyl)acrylate, poly-(2-hydroxyethyl)methacrylate groups, hydrophilic polypeptide groups and copolymers of the corresponding monomers; WG=antimicrobially active group; Z=is absent, O, S, an ester, amide or urethane group; Y=is absent, O, S, an ester, amide or urethane group, and which has a molecular weight of at least 1,000.