发明授权
US07557821B2 Laser exposure device and optical axis adjustment method in laser exposure device
有权
激光曝光装置中的激光曝光装置和光轴调整方法
- 专利标题： Laser exposure device and optical axis adjustment method in laser exposure device
- 专利标题（中）： 激光曝光装置中的激光曝光装置和光轴调整方法
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申请号： US11675421申请日： 2007-02-15
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公开(公告)号： US07557821B2公开(公告)日： 2009-07-07
- 发明人: Takeshi Endo , Takahiro Kojima , Kazutoshi Takahashi
- 申请人： Takeshi Endo , Takahiro Kojima , Kazutoshi Takahashi
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： Toshiba Tec Kabushiki Kaisha,Kabushiki Kaisha Toshiba
- 当前专利权人： Toshiba Tec Kabushiki Kaisha,Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo JP Tokyo
- 代理机构： Turocy & Watson, LLP
- 优先权： JP2006-043115 20060220
- 主分类号： B41J2/44
- IPC分类号： B41J2/44
摘要：
In a laser exposure device according to the present invention, a positioning pin, which is formed in a lens holder supporting a lens system, is inserted through an elongated hole for restriction of a board holder supporting a laser diode. An eccentric cam is inserted into an elongated hole for rotation movement formed in a board holder and a circular hole for rotation movement which is formed in the lens holder and which faces the elongated hole for rotation movement. An eccentric cam is inserted into an elongated hole for slide movement formed in the board holder and a circular hole for slide movement which is formed in the lens holder and which faces the elongated hole for slide movement. The eccentric cams are rotated to relatively move the board holder and lens holder with respect to each other to thereby establish alignment between the optical axes of the laser diode and lens system. In a state where the eccentric cams are fitted into the elongated holes, the board holder and lens holder are fixed to each other by screws.
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