发明授权
- 专利标题: High milling resistance write pole fabrication method for perpendicular recording
- 专利标题(中): 用于垂直记录的高铣削电阻写极制造方法
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申请号: US10836867申请日: 2004-04-30
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公开(公告)号: US07563381B2公开(公告)日: 2009-07-21
- 发明人: Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas J. Werner , Sue S. Zhang
- 申请人: Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas J. Werner , Sue S. Zhang
- 申请人地址: NL Amsterdam
- 专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人地址: NL Amsterdam
- 代理机构: Zilka-Kotab, PC
- 主分类号: G11B5/187
- IPC分类号: G11B5/187
摘要:
A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.