发明授权
- 专利标题: Liquid processing apparatus and liquid processing method
- 专利标题(中): 液体处理装置和液体处理方法
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申请号: US10796179申请日: 2004-03-10
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公开(公告)号: US07566365B2公开(公告)日: 2009-07-28
- 发明人: Shinji Kobayashi , Tetsushi Miyamoto , Masahito Hamada
- 申请人: Shinji Kobayashi , Tetsushi Miyamoto , Masahito Hamada
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2003-063852 20030310
- 主分类号: B05C5/02
- IPC分类号: B05C5/02
摘要:
In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
公开/授权文献
- US20040180142A1 Liquid processing apparatus and liquid processing method 公开/授权日:2004-09-16