Invention Grant
- Patent Title: Thin film fuse phase change RAM and manufacturing method
- Patent Title (中): 薄膜保险丝相变RAM及制造方法
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Application No.: US11959708Application Date: 2007-12-19
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Publication No.: US07579613B2Publication Date: 2009-08-25
- Inventor: Hsiang Lan Lung , Shih-Hung Chen
- Applicant: Hsiang Lan Lung , Shih-Hung Chen
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L29/02
- IPC: H01L29/02

Abstract:
A memory device comprising a first electrode having a top side, a second electrode having a top side and an insulating member between the first electrode and the second electrode. The insulating member has a thickness between the first and second electrodes near the top side of the first electrode and the top side of the second electrode. A bridge of memory material crosses the insulating member, and defines an inter-electrode path between the first and second electrodes across the insulating member. An array of such memory cells is provided. In the array, a plurality of electrode members and insulating members therebetween comprise an electrode layer on an integrated circuit. The bridges of memory material have sub-lithographic dimensions.
Public/Granted literature
- US20080105862A1 THIN FILM FUSE PHASE CHANGE RAM AND MANUFACTURING METHOD Public/Granted day:2008-05-08
Information query
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