Invention Grant
- Patent Title: Apparatus for processing surface of substrate
- Patent Title (中): 用于处理衬底表面的设备
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Application No.: US11157522Application Date: 2005-06-21
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Publication No.: US07582163B2Publication Date: 2009-09-01
- Inventor: Tae-Gyu Kim , Tae-Sang Park
- Applicant: Tae-Gyu Kim , Tae-Sang Park
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd
- Current Assignee: Samsung Electronics Co., Ltd
- Current Assignee Address: KR
- Agency: The Farrell Law Firm, PC
- Priority: KR10-2004-0049274 20040629
- Main IPC: B05C11/02
- IPC: B05C11/02 ; B05B1/28 ; B05B3/00

Abstract:
A substrate surface processing apparatus is provided. In the substrate surface processing apparatus, a spin chuck holds a substrate thereon by suction, spins the substrate, and moves up and down the substrate. An upper bowl and a lower bowl surround the spin chuck for receiving a processing solution by which the surface of the substrate is processed. An air outlet is positioned under the lower bowl for exhausting air from the upper and lower bowls. A flow separation protrusion is formed within the upper bowl. It separates an air flow around the substrate into an upward air flow and a downward air flow and exhausts the downward air flow through the air outlet.
Public/Granted literature
- US20050284362A1 Apparatus for processing surface of substrate Public/Granted day:2005-12-29
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