发明授权
- 专利标题: Lock mechanism for stage apparatus
- 专利标题(中): 舞台装置的锁定机构
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申请号: US11539193申请日: 2006-10-06
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公开(公告)号: US07583891B2公开(公告)日: 2009-09-01
- 发明人: Ken Hirunuma , Satoru Nemoto
- 申请人: Ken Hirunuma , Satoru Nemoto
- 申请人地址: JP Tokyo
- 专利权人: Hoya Corporation
- 当前专利权人: Hoya Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Greenblum & Bernstein, P.L.C.
- 优先权: JPP2005-294089 20051006
- 主分类号: G03B17/00
- IPC分类号: G03B17/00
摘要:
A lock mechanism for a stage apparatus, the stage apparatus having a stationary support board and a movable stage relatively movable in a plane parallel to the stationary support board, includes a pair of engaging members projecting from the movable stage; a rotational lock device including a pair of arm members rotatably mounted and relatively rotatable between an engaged position at which facing free ends of the arm members clasp corresponding engaging members, and a disengaged position at which the facing free ends of the arm members move away from the corresponding engaging members; a lock driving device which rotates the arm members to the engaged position upon the movable stage entering a non-operational state; and an unlock driving device which rotates the arm members to the disengaged position so that the movable stage enters an operational state.
公开/授权文献
- US20070096677A1 LOCK MECHANISM FOR STAGE APPARATUS 公开/授权日:2007-05-03
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