Invention Grant
US07584669B2 Method for recording microstructural changes in a component 失效
用于记录组件中的微结构变化的方法

Method for recording microstructural changes in a component
Abstract:
Method for recording microstructural changes in a layer system component. A specific material parameter of the component is measured. The layer system may include an alloy substrate and an alloy or porous ceramic layer. The material parameter may be measured a plurality of times. The measured material parameter may include electrical capacitance, specific heat capacity, peltier coefficient or magnetic susceptibility. The material parameter may first be measured on a new component and subsequent measurements may be performed at a time interval after operational use. The recorded material parameter is then used to determine microstructural changes in the substrate or the layer material of the component caused by changes in precipitation, cracks, or depletion of an alloying element.
Public/Granted literature
Information query
Patent Agency Ranking
0/0