Invention Grant
- Patent Title: Method for recording microstructural changes in a component
- Patent Title (中): 用于记录组件中的微结构变化的方法
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Application No.: US10589791Application Date: 2005-02-14
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Publication No.: US07584669B2Publication Date: 2009-09-08
- Inventor: Michael Dankert , Martin Feldhege , Stefan Irmisch , Matthias Oechsner , Eckart Schumann , Werner Stamm
- Applicant: Michael Dankert , Martin Feldhege , Stefan Irmisch , Matthias Oechsner , Eckart Schumann , Werner Stamm
- Applicant Address: DE Munich
- Assignee: Siemens Aktiengesellschaft
- Current Assignee: Siemens Aktiengesellschaft
- Current Assignee Address: DE Munich
- Priority: EP04003538 20040217
- International Application: PCT/EP2005/001469 WO 20050214
- International Announcement: WO2005/080937 WO 20050901
- Main IPC: G01N3/00
- IPC: G01N3/00

Abstract:
Method for recording microstructural changes in a layer system component. A specific material parameter of the component is measured. The layer system may include an alloy substrate and an alloy or porous ceramic layer. The material parameter may be measured a plurality of times. The measured material parameter may include electrical capacitance, specific heat capacity, peltier coefficient or magnetic susceptibility. The material parameter may first be measured on a new component and subsequent measurements may be performed at a time interval after operational use. The recorded material parameter is then used to determine microstructural changes in the substrate or the layer material of the component caused by changes in precipitation, cracks, or depletion of an alloying element.
Public/Granted literature
- US20070180897A1 Method for recording microstructural changes in a component Public/Granted day:2007-08-09
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