Invention Grant
- Patent Title: Enhanced plane light source
- Patent Title (中): 增强平面光源
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Application No.: US11417039Application Date: 2006-05-04
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Publication No.: US07586253B2Publication Date: 2009-09-08
- Inventor: Yi-Ping Lin , Jung-Yu Li , Ching-Sung Hsiao
- Applicant: Yi-Ping Lin , Jung-Yu Li , Ching-Sung Hsiao
- Applicant Address: TW Hsinchu Hsien
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu Hsien
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW94147100A 20051229
- Main IPC: H01J1/62
- IPC: H01J1/62

Abstract:
An enhanced plane light source has a luminescent layer independently disposed in each recess formed on a light-transmittable substrate, so that field emission electrons directly impact the luminescent layer to produce light, which is not shielded by the cathode. The enhanced plane light source also includes a substrate forming a bottom structure thereof. The bottom substrate has a metal reflection surface to increase the reflectivity and upgrade light-emitting efficiency and luminous intensity. The recesses on the light-transmittable substrate have an approximate semi-circular or semi-parabolic cross section to increase the high field region at the cathode and the effective luminescent area at the anode, so that the luminous intensity and evenness are also largely increased.
Public/Granted literature
- US20070152564A1 Enhanced plane light source Public/Granted day:2007-07-05
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