发明授权
- 专利标题: Fabricating arrays of metallic nanostructures
- 专利标题(中): 制造金属纳米结构阵列
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申请号: US11021615申请日: 2004-12-22
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公开(公告)号: US07592255B2公开(公告)日: 2009-09-22
- 发明人: Philip J Kuekes , M. Saif Islam , Shih-Yuan Wang , Alexandre M. Bratkovski
- 申请人: Philip J Kuekes , M. Saif Islam , Shih-Yuan Wang , Alexandre M. Bratkovski
- 申请人地址: US TX Houston
- 专利权人: Hewlett-Packard Development Company, L.P.
- 当前专利权人: Hewlett-Packard Development Company, L.P.
- 当前专利权人地址: US TX Houston
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
A patterned array of metallic nanostructures and fabrication thereof is described. A plurality of nanowires is grown on a substrate, the plurality of nanowires being laterally arranged on the substrate in a predetermined array pattern. The plurality of nanowires is coated with a metal to generate a plurality of metal-coated nanowires. Vacancies between the metal-coated nanowires are filled in with a sacrificial material for stabilization, and the metal-coated nanowires are planarized. The sacrificial material is removed, the patterned array of metallic nanostructures being formed by the plurality of planarized metal-coated nanowires.
公开/授权文献
- US20060131695A1 Fabricating arrays of metallic nanostructures 公开/授权日:2006-06-22