发明授权
US07596162B2 Method for forming a coating film on a facet of a semiconductor laser diode
有权
在半导体激光二极管的面上形成涂膜的方法
- 专利标题: Method for forming a coating film on a facet of a semiconductor laser diode
- 专利标题(中): 在半导体激光二极管的面上形成涂膜的方法
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申请号: US11896457申请日: 2007-08-31
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公开(公告)号: US07596162B2公开(公告)日: 2009-09-29
- 发明人: Chie Fukuda , Hiroyuki Ichikawa
- 申请人: Chie Fukuda , Hiroyuki Ichikawa
- 申请人地址: JP Osaka
- 专利权人: Sumitomo Electric Industries Ltd.
- 当前专利权人: Sumitomo Electric Industries Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Smith, Gambrell & Russell, LLP
- 优先权: JP2006-237978 20060901
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
The present invention is to provide a method for producing a semiconductor laser diode (LD) with an enhanced ESD resistance. The method includes a step for forming an aluminum film on a facet of the LD and a step for forming an aluminum oxide film on the aluminum film. The underlying aluminum film is oxidized during the formation of the aluminum oxide film to form a double aluminum oxide layer. The ratio of the oxide composition of the underlying aluminum oxide film is smaller than that of the upper aluminum oxide film.
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