发明授权
- 专利标题: Sensor for lithographic apparatus and method of obtaining measurements of lithographic apparatus
- 专利标题(中): 用于光刻设备的传感器和获得光刻设备测量的方法
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申请号: US10582247申请日: 2004-12-09
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公开(公告)号: US07599811B2公开(公告)日: 2009-10-06
- 发明人: Frits Jurgen Van Hout , Josephus Antonius Maria Van Bommel , Peter Dirksen , Mark Kroon , Casparus Anthonius Henricus Juffermans , Renatus Maria Adrianus Mathias Van Den Eijnden
- 申请人: Frits Jurgen Van Hout , Josephus Antonius Maria Van Bommel , Peter Dirksen , Mark Kroon , Casparus Anthonius Henricus Juffermans , Renatus Maria Adrianus Mathias Van Den Eijnden
- 申请人地址: NL Veldhoven NL Eindhoven
- 专利权人: ASML Netherlands B.V.,Koninklijke Philips Electronics N.V.
- 当前专利权人: ASML Netherlands B.V.,Koninklijke Philips Electronics N.V.
- 当前专利权人地址: NL Veldhoven NL Eindhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 国际申请: PCT/NL2004/000855 WO 20041209
- 国际公布: WO2005/057290 WO 20050623
- 主分类号: G06F15/00
- IPC分类号: G06F15/00
摘要:
A sensor arrangement may be used to measure properties, such as optical properties, of a device arranged to process substrates. The sensor arrangement includes a substrate having the following: a plurality of sensor elements provided as an integrated circuit in the substrate, for each one of the plurality of sensor elements associated electronic circuitry comprising a processing circuit connected to the sensor element and an input/output interface connected to the processing circuit, and a power supply unit configured to supply operating power only to the electronic circuitry associated with one or more of the plurality of sensor elements which are in use. The at least one sensor element and possibly the processing electronics, the input/output unit, and/or the power supply unit may be provided as one or more integrated circuits or other structures in the substrate.
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