发明授权
- 专利标题: Method and apparatus for inspecting a surface
- 专利标题(中): 检查表面的方法和装置
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申请号: US12002718申请日: 2007-12-18
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公开(公告)号: US07602481B2公开(公告)日: 2009-10-13
- 发明人: Albert Kreh
- 申请人: Albert Kreh
- 申请人地址: DE Weilburg
- 专利权人: Vistec Semiconductor Systems GmbH
- 当前专利权人: Vistec Semiconductor Systems GmbH
- 当前专利权人地址: DE Weilburg
- 代理机构: Davidson, Davidson & Kappel, LLC
- 优先权: DE102007002711 20070118
- 主分类号: G01N21/88
- IPC分类号: G01N21/88
摘要:
A method and an apparatus for inspecting a surface of a wafer disclosed. At least one incident-light illuminator is provided to illuminate an area of the surface of the wafer in a first and a second illumination mode, in particular a bright-field and a dark-field illumination. At least one image detector is provided to detect an image of the illuminated area. A storage device is used for storing values on the intensity and the color of an optimized illumination of each incident-light illumination mode.
公开/授权文献
- US20080174780A1 Method and apparatus for inspecting a surface 公开/授权日:2008-07-24
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