发明授权
- 专利标题： Methods and systems for inkjet drop positioning
- 专利标题（中）： 喷墨定位方法和系统
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申请号： US11238636申请日： 2005-09-29
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公开(公告)号： US07611217B2公开(公告)日： 2009-11-03
- 发明人: Bassam Shamoun , Janusz Jozwiak , Eugene Mirro , Quanyuan Shang , Shinichi Kurita , John M. White
- 申请人： Bassam Shamoun , Janusz Jozwiak , Eugene Mirro , Quanyuan Shang , Shinichi Kurita , John M. White
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Dugan & Dugan, PC
- 主分类号： B41J29/38
- IPC分类号： B41J29/38
摘要：
Methods and apparatus for inkjet inkjet drop positioning are provided. A first method includes determining an intended deposition location of an ink drop on a substrate, depositing the ink drop on the substrate using an inkjet printing system, detecting a deposited location of the deposited ink drop on the substrate, comparing the deposited location to the intended location, determining a difference between the deposited location and the intended location, and compensating for the difference between the deposited location and the intended location by adjusting a parameter of an inkjet printing system. Numerous other aspects are provided.
公开/授权文献
- US20070070107A1 Methods and systems for inkjet drop positioning 公开/授权日：2007-03-29
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