发明授权
- 专利标题: Spectrum based endpointing for chemical mechanical polishing
- 专利标题(中): 基于光谱的化学机械抛光终点
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申请号: US11747786申请日: 2007-05-11
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公开(公告)号: US07614936B2公开(公告)日: 2009-11-10
- 发明人: Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
- 申请人: Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Fish & Richardson P.C.
- 主分类号: B24B1/00
- IPC分类号: B24B1/00 ; B24B49/00 ; B24B51/00
摘要:
Methods and apparatus for providing a flushing system for flushing a top surface of an optical head. The flushing system includes a source of gas configured to provide a flow of gas, a delivery nozzle, a delivery line that connects the source of gas to the delivery nozzle, a vacuum source configured to provide a vacuum, a vacuum nozzle, and a vacuum line that connects the vacuum source to the vacuum nozzle. The source of gas and the delivery nozzle are configured to direct a flow of gas across the top surface of the optical head. The vacuum nozzle and vacuum sources are configured so that the flow if gas is laminar.
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