Invention Grant
US07615338B2 Photoresist coating composition and method for forming fine pattern using the same
有权
光刻胶涂料组合物和使用其形成精细图案的方法
- Patent Title: Photoresist coating composition and method for forming fine pattern using the same
- Patent Title (中): 光刻胶涂料组合物和使用其形成精细图案的方法
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Application No.: US11298385Application Date: 2005-12-08
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Publication No.: US07615338B2Publication Date: 2009-11-10
- Inventor: Geun Su Lee , Seung Chan Moon , Seung Hun Lee
- Applicant: Geun Su Lee , Seung Chan Moon , Seung Hun Lee
- Applicant Address: KR Icheon-shi KR Daegugwangyeok-si
- Assignee: Hynix Semiconductor Inc.,Youngchang Chemical Co., Ltd.
- Current Assignee: Hynix Semiconductor Inc.,Youngchang Chemical Co., Ltd.
- Current Assignee Address: KR Icheon-shi KR Daegugwangyeok-si
- Agency: Marshall, Gerstein & Borun LLP
- Priority: KR10-2005-0041957 20050519
- Main IPC: G03C1/73
- IPC: G03C1/73 ; G03F7/26 ; G03F7/36
Abstract:
A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist pattern to effectively reduce a size of a photoresist contact hole and a space, which can be applied to all semiconductor processes.
Public/Granted literature
- US20060263717A1 Photoresist coating composition and method for forming fine pattern using the same Public/Granted day:2006-11-23
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