发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
-
申请号： US10847661申请日： 2004-05-18
-
公开(公告)号： US07616383B2公开(公告)日： 2009-11-10
- 发明人: Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
- 申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G02B3/12
- IPC分类号： G02B3/12
摘要：
A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
公开/授权文献
- US20050259232A1 Lithographic apparatus and device manufacturing method 公开/授权日：2005-11-24
信息查询
IPC分类:
| G | 物理 |
| G02 | 光学 |
| G02B | 光学元件、系统或仪器 |
| G02B3/00 | 简单或复合透镜 |
| G02B3/12 | .充入液体或抽空的透镜 |
