发明授权
US07627165B2 Pattern inspection method and apparatus using linear predictive model-based image correction technique
有权
使用基于线性预测模型的图像校正技术的图案检查方法和装置
- 专利标题: Pattern inspection method and apparatus using linear predictive model-based image correction technique
- 专利标题(中): 使用基于线性预测模型的图像校正技术的图案检查方法和装置
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申请号: US11360813申请日: 2006-02-24
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公开(公告)号: US07627165B2公开(公告)日: 2009-12-01
- 发明人: Junji Oaki , Shinji Sugihara , Yuichi Nakatani
- 申请人: Junji Oaki , Shinji Sugihara , Yuichi Nakatani
- 申请人地址: JP Yokohama-shi
- 专利权人: Advanced Mask Inspection Technology Inc.
- 当前专利权人: Advanced Mask Inspection Technology Inc.
- 当前专利权人地址: JP Yokohama-shi
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2005-276583 20050922
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
An image correction device for use in pattern inspection apparatus is disclosed. This device includes a pattern extraction unit for extracting a pattern, as a cut-and-paste pattern, from a pattern existence region of an inspection reference pattern image and a pattern image of a workpiece being tested. The device also includes a pattern pasting unit for pasting the cut-and-paste pattern in blank regions of the reference and under-test pattern images to thereby create a pasted reference pattern image and a pasted test pattern image. The device further includes an equation generator for generating by linear predictive modeling a set of simultaneous equations relative to the pasted reference and test pattern images, a parameter generator for solving these equations to obtain a model parameter(s), and a unit for creating a corrected pattern image by the linear predictive modeling using the model parameter(s).
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