发明授权
- 专利标题： Algorithm for real-time process control of electro-polishing
- 专利标题（中）： 电抛光实时过程控制算法
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申请号： US11475583申请日： 2006-06-27
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公开(公告)号： US07628905B2公开(公告)日： 2009-12-08
- 发明人: Antoine P. Manens , Alain Duboust , Siew S. Neo , Liang-Yuh Chen
- 申请人： Antoine P. Manens , Alain Duboust , Siew S. Neo , Liang-Yuh Chen
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan
- 主分类号： B23H3/02
- IPC分类号： B23H3/02
摘要：
Method and apparatus for process control of electro-processes. The method includes electro-processing a wafer by the application of two or more biases and determining an amount of charge removed as a result of each bias, separately. In one embodiment, an endpoint is determined for each bias when the amount of charge removed for a bias substantially equals a respective target charge calculated for the bias.