发明授权
US07629089B2 Low-expansion glass substrate for a reflective mask and reflective mask
有权
用于反光罩和反光罩的低膨胀玻璃基板
- 专利标题： Low-expansion glass substrate for a reflective mask and reflective mask
- 专利标题（中）： 用于反光罩和反光罩的低膨胀玻璃基板
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申请号： US11519078申请日： 2006-09-12
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公开(公告)号： US07629089B2公开(公告)日： 2009-12-08
- 发明人: Masabumi Ito , Hitoshi Mishiro
- 申请人： Masabumi Ito , Hitoshi Mishiro
- 申请人地址： JP Tokyo
- 专利权人： Asahi Glass Company, Limited
- 当前专利权人： Asahi Glass Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2004-127307 20040422
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; B32B9/00
摘要：
A low-expansion glass substrate for a reflective mask, wherein the glass substrate is suited for a base material of a reflective mask employed in a lithographic process in semiconductor fabrication, comprises a lateral surface, a chamfered portion and a notched portion formed along an outer periphery thereof, at least one of the lateral surface, the chamfered portion and the notched portion being provided with a mirror-finished surface.
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