发明授权
- 专利标题: Levenson type phase shift mask and manufacturing method thereof
- 专利标题(中): 莱文森型相移掩模及其制造方法
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申请号: US11583797申请日: 2006-10-20
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公开(公告)号: US07632613B2公开(公告)日: 2009-12-15
- 发明人: Yosuke Kojima , Toshio Konishi , Keishi Tanaka , Masao Otaki , Jun Sasaki
- 申请人: Yosuke Kojima , Toshio Konishi , Keishi Tanaka , Masao Otaki , Jun Sasaki
- 申请人地址: JP Tokyo
- 专利权人: Toppan Printing Co., Ltd.
- 当前专利权人: Toppan Printing Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2004-128043 20040423
- 主分类号: G03F1/00
- IPC分类号: G03F1/00
摘要:
A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.
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