发明授权
- 专利标题: Filter exposure apparatus, and device manufacturing method
- 专利标题(中): 过滤曝光装置和装置制造方法
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申请号: US11456673申请日: 2006-07-11
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公开(公告)号: US07633598B2公开(公告)日: 2009-12-15
- 发明人: Mitsuaki Amemiya
- 申请人: Mitsuaki Amemiya
- 申请人地址: JP
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP
- 代理机构: Rossi, Kimms & McDowell, LLP
- 优先权: JP2005-203544 20050712
- 主分类号: G03B27/42
- IPC分类号: G03B27/42
摘要:
A filter used for an exposure apparatus that exposes a plate using a light from a light source includes a light transmitting film configured to transmit the light from the light source, a first rod member that includes plural first rod members, and thermally contacts the light transmitting film, the plural second rod members being rod members and including a second rod member; and a second member that includes plural second rod members, and thermally contacts the light transmitting film and/or the first member, the plural second rod members being other rod members including a second rod member, wherein a heating value transmittable by the first rod member per unit time in a longitudinal direction of the first rod member is smaller than a heating value transmittable by the second rod member per unit time in a longitudinal direction of the second rod member.
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