发明授权
- 专利标题: Diabody-type bispecific antibody
- 专利标题(中): 双抗体型双特异性抗体
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申请号: US10642284申请日: 2003-08-18
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公开(公告)号: US07635475B2公开(公告)日: 2009-12-22
- 发明人: Izumi Kumagai , Toshio Kudo , Kouhei Tsumoto , Ryutaro Asano
- 申请人: Izumi Kumagai , Toshio Kudo , Kouhei Tsumoto , Ryutaro Asano
- 申请人地址: JP Sendai-Shi
- 专利权人: Tohoku Techno Arch Co., Ltd.
- 当前专利权人: Tohoku Techno Arch Co., Ltd.
- 当前专利权人地址: JP Sendai-Shi
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2003-038643 20030217
- 主分类号: A61K39/395
- IPC分类号: A61K39/395 ; C12P21/08
摘要:
The purpose of the present invention is to provide a diabody-type bispecific antibody, which is characterized by having low immunogenicity and high infiltrating activity into tumor tissues, and by being easily mass-produced at a low cost with use of microorganisms, and by being easily altered in function by means of genetic engineering. The diabody-type bispecific antibody shows a more remarkable effect than the conventional diabody-type bispecific antibodies and chemically synthesized bispecific antibodies even in a very low concentration and in the absence of the super antigen. The present invention is related to a diabody-type bispecific antibody, having a first specificity to a human epidermal growth factor (EGF) receptor and a second specificity to a surface antigen expressed by a cell having phagocytosis or cytotoxic activity, a single-chain polypeptide constituting the antibody or each region contained therein, a nucleic acid encoding the polypeptide, a replicable cloning vector or expression vector comprising the nucleic acid, a host cell transformed with the vector, and a pharmaceutical preparation comprising thereof.
公开/授权文献
- US20060210564A1 Novel diabody-type bispecific antibody 公开/授权日:2006-09-21
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