发明授权
- 专利标题: Thin film transistor, method of manufacturing the thin film transistor, and display device
- 专利标题(中): 薄膜晶体管,制造薄膜晶体管的方法和显示装置
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申请号: US11733925申请日: 2007-04-11
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公开(公告)号: US07635619B2公开(公告)日: 2009-12-22
- 发明人: Hitoshi Nagata
- 申请人: Hitoshi Nagata
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Electric Corporation
- 当前专利权人: Mitsubishi Electric Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2006-109904 20060412
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
A thin film transistor according to an embodiment of the present invention includes: a semiconductor layer formed on a substrate and having a first diffusion region, a channel region, and a second diffusion region; a gate electrode opposite to the semiconductor layer across a gate insulating film formed on the semiconductor layer; and a connecting conductive film formed on the semiconductor layer opposite to the gate insulating film and extending from the first diffusion region up to a predetermined position in the channel region to electrically connect between the first diffusion region and the channel region. The transistor further includes a laying conductive layer formed on the semiconductor layer opposite to the gate insulating film and electrically connected with the second diffusion region.
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