发明授权
- 专利标题: Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
- 专利标题(中): 蒸发系统液体物质供应装置,蒸发器,蒸发性能评价方法
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申请号: US12219584申请日: 2008-07-24
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公开(公告)号: US07637482B2公开(公告)日: 2009-12-29
- 发明人: Naoki Yoshioka , Tatsushi Kawamoto , Mitsushi Kawao , Shigeru Matsuno , Akira Yamada , Shoji Miyashita , Fusaoki Uchikawa
- 申请人: Naoki Yoshioka , Tatsushi Kawamoto , Mitsushi Kawao , Shigeru Matsuno , Akira Yamada , Shoji Miyashita , Fusaoki Uchikawa
- 申请人地址: JP Kyoto-shi JP Tokyo
- 专利权人: Shimadzu Corporation,Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Shimadzu Corporation,Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JP Kyoto-shi JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2000-292757 20000926; JP2000-292758 20000926; JP2000-292759 20000926
- 主分类号: B01F3/04
- IPC分类号: B01F3/04
摘要:
In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.
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