发明授权
US07639321B2 Method of manufacturing a color filter substrate with trenches for a black matrix
有权
制造具有用于黑色矩阵的沟槽的滤色器基板的方法
- 专利标题: Method of manufacturing a color filter substrate with trenches for a black matrix
- 专利标题(中): 制造具有用于黑色矩阵的沟槽的滤色器基板的方法
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申请号: US11208487申请日: 2005-08-19
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公开(公告)号: US07639321B2公开(公告)日: 2009-12-29
- 发明人: Oh Nam Kwon , Heung Lyul Cho , Seung Hee Nam
- 申请人: Oh Nam Kwon , Heung Lyul Cho , Seung Hee Nam
- 申请人地址: KR Seoul
- 专利权人: LG. Display Co., Ltd.
- 当前专利权人: LG. Display Co., Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: Brinks Hofer Gilson & Lione
- 优先权: KR10-2005-0046723 20050601; KR10-2005-0075823 20050818
- 主分类号: G02F1/1335
- IPC分类号: G02F1/1335 ; G02F1/1333
摘要:
A color filter substrate for an LCD device and a method for manufacturing the same, in which process steps are simplified and the manufacturing cost is reduced. The color filter substrate for an LCD device includes a substrate defined by a plurality of color filter regions and a black matrix region, R, G and B color filters respectively formed in the color filter regions of the substrate, a trench formed in the black matrix region of the substrate at a predetermined depth, and a black matrix formed inside the trench by overlapping the color filters.
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