Invention Grant
- Patent Title: Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
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Application No.: US11927725Application Date: 2007-10-30
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Publication No.: US07643100B2Publication Date: 2010-01-05
- Inventor: Shin-Ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
- Applicant: Shin-Ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young & Thompson
- Priority: JP2002-109447 20020411
- Main IPC: G02F1/136
- IPC: G02F1/136 ; G02F1/1335 ; H01L21/302 ; H01L21/461 ; B29D11/00

Abstract:
In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
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