A method of manufacturing an oscillator based on etching a monocrystal silicon substrate, the method including a mask forming step for forming, on the monocrystal silicon substrate, an etching mask having a pattern with a repetition shape comprised of a plurality of mutually coupled oscillators each including a torsion spring between a supporting base plate and a movable member, an etching step for etching the monocrystal silicon substrate while using the etching mask as a mask, to form on the monocrystal silicon substrate a repetition shape comprised of a plurality of corresponding mutually coupled oscillators, and a dicing step for determining a width of the movable member and the supporting base plate of each of the oscillators in the repetition shape, which width is effective to determine a resonance frequency of the individual oscillators required when these are used as oscillators, and for cutting by dicing the movable member and the supporting base plate between adjoining oscillators, at the determined width.