发明授权
- 专利标题: Photosensitive film
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申请号: US11558177申请日: 2006-11-09
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公开(公告)号: US07645562B2公开(公告)日: 2010-01-12
- 发明人: Jinko Kimura , Chikara Ishikawa , Youji Tanaka , Shinji Takano , Yoshitaka Minami
- 申请人: Jinko Kimura , Chikara Ishikawa , Youji Tanaka , Shinji Takano , Yoshitaka Minami
- 申请人地址: JP Tokyo
- 专利权人: Hitachi Chemical Company, Ltd.
- 当前专利权人: Hitachi Chemical Company, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Griffin & Szipl, P.C.
- 优先权: JP09/254816 19970919
- 主分类号: G03F7/00
- IPC分类号: G03F7/00 ; G03F7/004
摘要:
A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product yield, said film comprising a support film (A), a photosensitive resin composition-containing photosensitive resin layer (B) formed on said support (A) and a protecting film (C) further stuck on said layer (B), wherein the number of fish eyes having a diameter of at least 80 μm included in the protecting film (C) does not exceed 5 fish eyes/m2.
公开/授权文献
- US20070092835A1 PHOTOSENSITIVE FILM 公开/授权日:2007-04-26
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