发明授权
- 专利标题: Pattern forming method
- 专利标题(中): 图案形成方法
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申请号: US12268699申请日: 2008-11-11
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公开(公告)号: US07648813B2公开(公告)日: 2010-01-19
- 发明人: Mitsunaga Saito , Yasushi Shinjiyo , Yoshihiro Tajima , Koichi Ishii , Masahiro Hosoya , Ken Takahashi
- 申请人: Mitsunaga Saito , Yasushi Shinjiyo , Yoshihiro Tajima , Koichi Ishii , Masahiro Hosoya , Ken Takahashi
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2006-134022 20060512
- 主分类号: G03G13/045
- IPC分类号: G03G13/045
摘要:
By using an intaglio plate for holding a pattern formed by a developing agent, a transfer device for transferring patterns developed on the intaglio plate to a transfer object medium, and a baking chamber for eliminating an electrode layer after transfer or heightening resistance thereof, the patterns developed on the intaglio plate are transferred onto the electrode layer disposed at the opposite side of the transfer object medium, and then heated in the baking chamber, whereby the electrode layer is eliminated or heightened in resistance.
公开/授权文献
- US20090123855A1 PATTERN FORMING METHOD 公开/授权日:2009-05-14
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