Invention Grant
US07648849B2 Nitride semiconductor light emitting diode having mesh DBR reflecting layer
有权
氮化物半导体发光二极管具有网状DBR反射层
- Patent Title: Nitride semiconductor light emitting diode having mesh DBR reflecting layer
- Patent Title (中): 氮化物半导体发光二极管具有网状DBR反射层
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Application No.: US11933950Application Date: 2007-11-01
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Publication No.: US07648849B2Publication Date: 2010-01-19
- Inventor: Jae Hoon Lee , In Eung Kim , Yong Chun Kim , Hyun Kyung Kim , Moon Heon Kong
- Applicant: Jae Hoon Lee , In Eung Kim , Yong Chun Kim , Hyun Kyung Kim , Moon Heon Kong
- Applicant Address: KR Suwon, Kyungki-Do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon, Kyungki-Do
- Agency: Lowe Hauptman Ham & Berner
- Priority: KR10-2004-63214 20040811
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A flip chip-type nitride semiconductor light emitting diode includes a light transmittance substrate, an n-type nitride semiconductor layer, an active layer, a p-type nitride semiconductor layer and a mesh-type DBR reflecting layer. The mesh-type DBR reflecting layer has a plurality of open regions. The mesh-type DBR reflecting layer is composed of first and second nitride layers having different Al content. The first and second nitride layers are alternately stacked several times to form the mesh-type DBR reflecting layer. An ohmic contact layer is formed on the mesh-type DBR reflecting layer and on the p-type nitride semiconductor layer.
Public/Granted literature
- US20080064133A1 NITRIDE SEMICONDUCTOR LIGHT EMITTING DIODE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2008-03-13
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