Invention Grant
US07649973B1 Apparatus and method for z-location dependent x-ray beam filtration for imaging system
有权
用于成像系统的z位置相关x射线束过滤的装置和方法
- Patent Title: Apparatus and method for z-location dependent x-ray beam filtration for imaging system
- Patent Title (中): 用于成像系统的z位置相关x射线束过滤的装置和方法
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Application No.: US12244569Application Date: 2008-10-02
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Publication No.: US07649973B1Publication Date: 2010-01-19
- Inventor: Baojun Li , Thomas Louis Toth , Jiang Hsieh
- Applicant: Baojun Li , Thomas Louis Toth , Jiang Hsieh
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: The Small Patent Law Group
- Agent Dean D. Small
- Main IPC: G01N23/083
- IPC: G01N23/083
Abstract:
An imaging system includes at least two x-ray sources, an x-ray detector assembly and an attenuation filter. The at least two x-ray sources are displaced along a z-axis and configured to alternately emit x-ray beams. The x-ray detector assembly is configured to detect the x-ray beams. The attenuation filter is mounted proximate the at least two x-ray sources and is configured to provide different amounts of x-ray attenuation to the x-ray beams along the z-axis.
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