Invention Grant
US07659048B2 Printing resist, method for preparing the same and patterning method using the same
有权
印刷抗蚀剂，其制备方法和使用其的图案化方法
- Patent Title: Printing resist, method for preparing the same and patterning method using the same
- Patent Title (中): 印刷抗蚀剂，其制备方法和使用其的图案化方法
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Application No.: US11808418Application Date: 2007-06-08
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Publication No.: US07659048B2Publication Date: 2010-02-09
- Inventor: Jin Wuk Kim
- Applicant: Jin Wuk Kim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge
- Priority: KR10-2006-0052043 20060609
- Main IPC: G03F7/26
- IPC: G03F7/26 ; G03C1/00
Abstract:
Disclosed herein is a printing resist sequentially transferred to a printing plate and a substrate after being applied to a printing roll. The printing resist comprises at least one polymer main chain bound to a tackiness-inducing vinyl group. The surface of the printing resist has tackiness without complete dryness, thus enabling a correct transfer of the printing resist to the printing plate and substrate.
Public/Granted literature
- US20070287099A1 Printing resist, method for preparing the same and patterning method using the same Public/Granted day:2007-12-13
Information query
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