Invention Grant
- Patent Title: Decal transfer lithography
- Patent Title (中): 贴片转印光刻
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Application No.: US10965279Application Date: 2004-10-14
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Publication No.: US07662545B2Publication Date: 2010-02-16
- Inventor: Ralph G. Nuzzo , William R. Childs , Michael J. Motala , Keon Jae Lee
- Applicant: Ralph G. Nuzzo , William R. Childs , Michael J. Motala , Keon Jae Lee
- Applicant Address: US IL Urbana
- Assignee: The Board of Trustees of the University of Illinois
- Current Assignee: The Board of Trustees of the University of Illinois
- Current Assignee Address: US IL Urbana
- Agency: Blanchard & Associates
- Main IPC: G03F7/00
- IPC: G03F7/00
Abstract:
A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.
Public/Granted literature
- US20060084012A1 Decal transfer lithography Public/Granted day:2006-04-20
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