Invention Grant
- Patent Title: Ink-jet ink composition
- Patent Title (中): 喷墨油墨组合物
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Application No.: US11808653Application Date: 2007-06-12
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Publication No.: US07662868B2Publication Date: 2010-02-16
- Inventor: Ippei Nakamura
- Applicant: Ippei Nakamura
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-167159 20060616
- Main IPC: C08F2/48
- IPC: C08F2/48 ; C08F2/50 ; C08J3/28 ; C09D11/00 ; C09D11/02 ; C09D11/10

Abstract:
The present invention relates to an ink-jet ink composition, which comprises (A) a polybutadiene; (B) a radical polymerizable compound having a (meth)acryloyl group; (C) a radical polymerization initiator; and (D) a colorant. The ink composition is highly sensitive to activated radiant rays and can accordingly be cured in a high sensitivity when irradiated with the same, can maintain its flexibility even after the cure thereof and can accordingly be used suitably in the ink-jet recording method and a method for the preparation of a lithographic printing plate, to thus form printed matters and a lithographic printing plate having high printing durability.
Public/Granted literature
- US20070291080A1 Ink-jet ink composition Public/Granted day:2007-12-20
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