发明授权
- 专利标题: Coupling substrate for semiconductor components and method for producing the same
- 专利标题(中): 半导体元件用耦合基板及其制造方法
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申请号: US11522518申请日: 2006-09-18
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公开(公告)号: US07663223B2公开(公告)日: 2010-02-16
- 发明人: Jens Pohl
- 申请人: Jens Pohl
- 申请人地址: DE Neubiberg
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Neubiberg
- 代理机构: Edell, Shapiro & Finnan, LLC
- 优先权: DE102004012979 20040316
- 主分类号: H01L23/495
- IPC分类号: H01L23/495 ; H01L23/538
摘要:
A coupling substrate for semiconductor components includes a patterned metal layer on a topside of an insulating carrier. Metal tracks project beyond the insulating carrier, the metal tracks being angled away at the lateral edges of the carrier in the direction of the underside of the carrier and projecting beyond the underside of the carrier. The metal tracks have a metal coating, thereby enlarging each cross section such that the metal tracks form dimensionally stable, flat, conductor external contacts of the coupling substrate.
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