Invention Grant
- Patent Title: Method of making a photocatalytic material
- Patent Title (中): 制备光催化材料的方法
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Application No.: US12216785Application Date: 2008-07-10
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Publication No.: US07666926B2Publication Date: 2010-02-23
- Inventor: Tsuruo Nakayama , Nobukazu Motojima , Toru Yokomizo
- Applicant: Tsuruo Nakayama , Nobukazu Motojima , Toru Yokomizo
- Applicant Address: JP Tokyo
- Assignee: NBC Meshtec, Inc.
- Current Assignee: NBC Meshtec, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, LLP.
- Priority: JP2003-058560 20030305
- Main IPC: C03C25/28
- IPC: C03C25/28 ; B01J20/26

Abstract:
A method of making a photocatalytic material comprising a base substance and photocatalytic particles bonded on the base substance by chemical bonding through a silane compound. The chemical bonding is bonding a reactive group of the silane compound through graft polymerization to a radical produced on a resin surface of the base substance by irradiating radiation ray. The resulting photocatalytic material has the advantage that, even when used over a long time, the photocatalytic particles are less apt to shed and the resin base is less apt to deteriorate.
Public/Granted literature
- US20090005234A1 Photocatalytic material Public/Granted day:2009-01-01
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