发明授权
- 专利标题： Pattern generation method and charged particle beam writing apparatus
- 专利标题（中）： 图案生成方法和带电粒子束写入装置
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申请号： US11671243申请日： 2007-02-05
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公开(公告)号： US07669174B2公开(公告)日： 2010-02-23
- 发明人: Keiko Emi , Junichi Suzuki , Takayuki Abe
- 申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe
- 申请人地址： JP Numazu-shi
- 专利权人： NuFlare Technology, Inc.
- 当前专利权人： NuFlare Technology, Inc.
- 当前专利权人地址： JP Numazu-shi
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2006-036640 20060214; JP2006-263817 20060928
- 主分类号： G06F17/50
- IPC分类号： G06F17/50 ; G06F19/00 ; G21K5/00 ; G03F1/00
摘要：
A pattern generation method includes changing a dimension of a pattern included in each mesh-like region of a plurality of mesh-like regions by using an area of the pattern and a total sum of lengths of circumferential sides of the pattern included in each mesh-like region to correct a dimension error of the pattern, wherein the dimension error being caused by loading effects and the plurality of mesh-like regions being virtually divided from a pattern forming region of a target object, and generating a pattern of the dimension changed on the target object.
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