发明授权
US07671319B2 Lithographic apparatus, device manufacturing method and energy sensor
有权
光刻设备,器件制造方法和能量传感器
- 专利标题: Lithographic apparatus, device manufacturing method and energy sensor
- 专利标题(中): 光刻设备,器件制造方法和能量传感器
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申请号: US11711873申请日: 2007-02-28
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公开(公告)号: US07671319B2公开(公告)日: 2010-03-02
- 发明人: Willem Jurrianus Venema
- 申请人: Willem Jurrianus Venema
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: H01J40/14
- IPC分类号: H01J40/14 ; H01L31/00
摘要:
An energy sensor comprises a radiation-sensitive detector, a circuit, and an analog-to-digital converter. The radiation-sensitive detector is arranged to receive a pulsed radiation beam and to generate a current in response thereto. The circuit is equivalent to an RC network and is electrically connected across the radiation-sensitive detector. The analog-to-digital converter is electrically connected across a resistive component of the circuit and is arranged to output digital samples measuring the voltage across the resistive component at a sampling rate that is greater than the pulse repetition rate of the pulsed radiation beam. The energy sensor may be provided as part of a transmission image sensor.
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