发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US11132415申请日： 2005-05-19
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公开(公告)号： US07671963B2公开(公告)日： 2010-03-02
- 发明人: Bob Streefkerk , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M Zaal , Minne Cuperus
- 申请人： Bob Streefkerk , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M Zaal , Minne Cuperus
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/32
摘要：
An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
公开/授权文献
- US20050270506A1 Lithographic apparatus and device manufacturing method 公开/授权日：2005-12-08