发明授权
US07671968B2 Lithographic apparatus having masking parts and device manufacturing method
有权
具有掩模部件和装置制造方法的平版印刷装置
- 专利标题： Lithographic apparatus having masking parts and device manufacturing method
- 专利标题（中）： 具有掩模部件和装置制造方法的平版印刷装置
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申请号： US11486378申请日： 2006-07-14
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公开(公告)号： US07671968B2公开(公告)日： 2010-03-02
- 发明人: Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
- 申请人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
A lithographic apparatus includes a masking device that includes a first masking part configured to obscure a first part of a first patterning device before the pattern of the first patterning device is impinged by a radiation beam, a second masking part having an adjustable length, the second masking part configured to obscure a second part of the first patterning device after the pattern of the first patterning device is impinged by the radiation beam and to obscure a first part of a second patterning device before the pattern of the second patterning device is impinged by the radiation beam, and a third masking part configured to obscure a second part of the second patterning device after the pattern of the second patterning device is impinged by the radiation beam.