Invention Grant
- Patent Title: Optical diaphragm and projector
- Patent Title (中): 光学膜片和投影机
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Application No.: US11504641Application Date: 2006-08-16
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Publication No.: US07677740B2Publication Date: 2010-03-16
- Inventor: Kesatoshi Takeuchi , Hiroshi Kuriyama
- Applicant: Kesatoshi Takeuchi , Hiroshi Kuriyama
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-240899 20050823
- Main IPC: G03B21/14
- IPC: G03B21/14

Abstract:
An optical diaphragm for adjusting a light quantity of an incident light beam includes: a plurality of light-shielding vanes attached to a circumferential portion of an aperture of a base plate in a manner rotatable along a plane orthogonal to an optical axis of the light beam. The light-shielding vanes may be rotated to change an aperture area of the aperture of the base plate for transmitting the light beam. The plurality of light-shielding vanes each include a vane plate for intercepting the incident light beam; and a bearing integrally provided to the vane plate, the bearing each allowing a rotary shaft to be inserted therein so as to be supported by the rotary shaft. The vane plate is perpendicularly attached to the bearing. The plurality of light-shielding vanes move parallel to each other in an opening and closing direction thereof without crossing with each other.
Public/Granted literature
- US20070046905A1 Optical diaphragm and projector Public/Granted day:2007-03-01
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