Invention Grant
- Patent Title: Method and apparatus for manufacturing fine particles
- Patent Title (中): 微粒制造方法及装置
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Application No.: US11767886Application Date: 2007-06-25
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Publication No.: US07678326B2Publication Date: 2010-03-16
- Inventor: Isao Matsui
- Applicant: Isao Matsui
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2001-292279 20010925
- Main IPC: B22F9/16
- IPC: B22F9/16 ; B22F9/22 ; B22F1/00

Abstract:
An apparatus for manufacturing fine particles includes a reactor; a first inlet part including at least one port introducing a reactive gas flow containing a fine particle source material; a second inlet part including at least one port introducing a diluting gas flow; a heater exciting the fine particle source material in the reactive gas flow; a first plate including through-holes which substantially equalize a flow rate of the reactive gas flow with respect to a cross section of a flow channel; a second plate including through-holes which substantially equalize a flow rate of the diluting gas flow with respect to a cross section of a flow channel; a gas exhaust port provided in a merging region where the reactive gas flow passed through the first plate and the diluting gas flow passed through the second plate are merged; and a collector which collects fine particles.
Public/Granted literature
- US20070246868A1 METHOD AND APPARATUS FOR MANUFACTURING FINE PARTICLES Public/Granted day:2007-10-25
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