发明授权
- 专利标题: Double stage charged particle beam energy width reduction system for charged particle beam system
- 专利标题(中): 用于带电粒子束系统的双级带电粒子束能量减小系统
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申请号: US10571347申请日: 2004-09-02
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公开(公告)号: US07679054B2公开(公告)日: 2010-03-16
- 发明人: Jürgen Frosien , Ralf Degenhardt , Stefan Lanio
- 申请人: Jürgen Frosien , Ralf Degenhardt , Stefan Lanio
- 申请人地址: DE Heimstetten
- 专利权人: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- 当前专利权人: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- 当前专利权人地址: DE Heimstetten
- 代理机构: Patterson & Sheridan, LLP
- 优先权: EP03020710 20030911; EP03020711 20030911; EP03028696 20031216
- 国际申请: PCT/EP2004/009801 WO 20040902
- 国际公布: WO2005/024888 WO 20050317
- 主分类号: H01J49/00
- IPC分类号: H01J49/00
摘要:
The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element acting in a focusing and dispersive manner, a second element acting in a focusing and dispersive manner, a first quadrupole element being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.
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