发明授权
US07679055B2 Pattern displacement measuring method and pattern measuring device 有权
图案位移测量方法和图案测量装置

Pattern displacement measuring method and pattern measuring device
摘要:
An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
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