发明授权
- 专利标题: Pattern displacement measuring method and pattern measuring device
- 专利标题(中): 图案位移测量方法和图案测量装置
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申请号: US11892675申请日: 2007-08-24
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公开(公告)号: US07679055B2公开(公告)日: 2010-03-16
- 发明人: Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
- 申请人: Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2006-235876 20060831
- 主分类号: G06K9/48
- IPC分类号: G06K9/48 ; G06K9/00
摘要:
An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
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