发明授权
- 专利标题： Wafer-level alignment of optical elements
- 专利标题（中）： 光学元件的晶片级对准
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申请号： US11771642申请日： 2007-06-29
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公开(公告)号： US07680376B2公开(公告)日： 2010-03-16
- 发明人: Andreas Goebel , Gregory L. Wojcik , Lawrence C. West
- 申请人： Andreas Goebel , Gregory L. Wojcik , Lawrence C. West
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Townsend and Townsend and Crew, LLP
- 主分类号： G02B6/30
- IPC分类号： G02B6/30 ; G02B6/26 ; G02B6/42
摘要：
Methods are disclosed of fabricating an optical assembly. An active optical element is disposed near or on a first surface of a slab of optical material. A passive optical element is formed on a second surface of the slab, with the second surface being substantially parallel to the first surface. An optical axis of the passive optical element is aligned with an optical path between the passive optical element and an active region of the active optical element using a lithographic alignment process.
公开/授权文献
- US20080050081A1 WAFER-LEVEL ALIGNMENT OF OPTICAL ELEMENTS 公开/授权日：2008-02-28
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