Invention Grant
US07680557B2 System for processing semiconductor substrate by using laser and method of the same 失效
使用激光加工半导体衬底的系统及其方法

  • Patent Title: System for processing semiconductor substrate by using laser and method of the same
  • Patent Title (中): 使用激光加工半导体衬底的系统及其方法
  • Application No.: US11575706
    Application Date: 2004-09-22
  • Publication No.: US07680557B2
    Publication Date: 2010-03-16
  • Inventor: Dae-Jin KimJe-Kil RyuHyun-Jung Kim
  • Applicant: Dae-Jin KimJe-Kil RyuHyun-Jung Kim
  • Applicant Address: KR Yongin-si, Gyeonggi-do
  • Assignee: Hantech Co., Ltd.
  • Current Assignee: Hantech Co., Ltd.
  • Current Assignee Address: KR Yongin-si, Gyeonggi-do
  • Agency: Ladas & Parry LLP
  • International Application: PCT/KR2004/002427 WO 20040922
  • International Announcement: WO2006/033489 WO 20060330
  • Main IPC: G06F19/00
  • IPC: G06F19/00
System for processing semiconductor substrate by using laser and method of the same
Abstract:
The present invention provides a system for processing a semiconductor substrate using a laser beam, the system including: a storing unit storing a process control data set for a slot for loading the semiconductor substrate therein; a process controlling unit detecting identification information of the slot in which the semiconductor substrate is loaded, and reading the control data, which is set for the detected identification information, from the storing unit to control a process of the semiconductor substrate; and a substrate processing unit processing the semiconductor substrate on the basis of the read control data using the laser beam with a predetermined energy.
Information query
Patent Agency Ranking
0/0