发明授权
US07682772B2 Resist composition, method of forming resist pattern, novel compound, and acid generator
有权
抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
- 专利标题： Resist composition, method of forming resist pattern, novel compound, and acid generator
- 专利标题（中）： 抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
-
申请号： US12265607申请日： 2008-11-05
-
公开(公告)号： US07682772B2公开(公告)日： 2010-03-23
- 发明人: Takehiro Seshimo , Yoshiyuki Utsumi , Akiya Kawaue , Hideo Hada , Hiroaki Shimizu , Tsuyoshi Nakamura
- 申请人： Takehiro Seshimo , Yoshiyuki Utsumi , Akiya Kawaue , Hideo Hada , Hiroaki Shimizu , Tsuyoshi Nakamura
- 申请人地址： JP Kawasaki-shi
- 专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址： JP Kawasaki-shi
- 代理机构： Knobbe, Martens, Olson & Bear, LLP
- 优先权： JP2007-299527 20071119; JP2008-074466 20080321; JP2008-246643 20080925
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30 ; C07D327/02
摘要：
A compound represented by general formula (I); and a compound represented by general formula (b1-1).[Chemical Formula 1] X-Q1-Y1—SO3−M+ (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
公开/授权文献
信息查询
IPC分类:
