Invention Grant
US07682772B2 Resist composition, method of forming resist pattern, novel compound, and acid generator
有权
抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
- Patent Title: Resist composition, method of forming resist pattern, novel compound, and acid generator
- Patent Title (中): 抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
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Application No.: US12265607Application Date: 2008-11-05
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Publication No.: US07682772B2Publication Date: 2010-03-23
- Inventor: Takehiro Seshimo , Yoshiyuki Utsumi , Akiya Kawaue , Hideo Hada , Hiroaki Shimizu , Tsuyoshi Nakamura
- Applicant: Takehiro Seshimo , Yoshiyuki Utsumi , Akiya Kawaue , Hideo Hada , Hiroaki Shimizu , Tsuyoshi Nakamura
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP2007-299527 20071119; JP2008-074466 20080321; JP2008-246643 20080925
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C07D327/02
Abstract:
A compound represented by general formula (I); and a compound represented by general formula (b1-1).[Chemical Formula 1] X-Q1-Y1—SO3−M+ (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
Public/Granted literature
- US20090130597A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR Public/Granted day:2009-05-21
Information query
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